The XDV-µ WAFER allows you to analyze individual microstructures much more precisely than any conventional device can. The polycapillary optics integrated in the XRF-device focus the X-rays onto smallest measuring spots of 10 or 20 µm at short measuring times with high intensity. Featuring a silicon drift detector (SDD) of 20 mm² or 50 mm² for maximum precision on thin layers.